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Low pressure chemical vapor deposition of silicon nitride and silicon oxynitride layers and their application in optical waveguide based chemical sens [...] / Ahmed Tamim. 2007
Inhalt
cover English
aknow-
Abstract
Deutsch Abstract
PhD
1.1 Silicon technology
1.2 Low pressure chemical vapor deposition (LPCVD)
1.3 Silicon nitride (Si3N4)
1.4 Silicon oxynitride (SiON)
1.5 Optical waveguides
1.5.1 Light coupling into waveguides
1.5.2 Optical losses
1.6 Chemical sensors
1.6.1 Background
1.6.2 Historical Perspective of chemical sensors
1.6.3 Applications of chemical sensors
1.7 Optical waveguide based chemical sensors
1.7.1 Refractive chemical sensors
1.8 Ammonia sensors
2.1 Introduction
2.2 Waveguide design
2.3 Design of Mach–Zehnder interferometer (MZI)
2.4 The heater design
3.1 Introduction
3.2 Description of LPCVD process
3.3 Measuring of layer thickness and refractive index by ellipsometer
3.4 Preparation of the silicon wafers
3.5 Deposition process
3.5.1 Silicon nitride (Si3N4) deposition
3.5.1.1 Deposition of Si3N4 at 740 °C
3.5.1.2 Deposition of Si3N4 at 760 °C
3.5.1.3 Deposition of Si3N4 at 780 °C
3.5.1.4 Temperature optimization
3.5.2 Silicon oxynitride (SiON) deposition
4.1 Introduction
4.2 Sensor fabrication
4.2.1 MZI waveguide fabrication
4.2.2 Heater fabrication
4.2.3 Sensitive layer fabrication
To build a sensor, sensitive material had to be selected that changes its refractive index in response to the presence of a targeted chemical substance, such as ammonia in ambient air. One of the choices was a thin film of polymer doped with an appropriate indicator dye. Dye-doped polymers are traditionally used in optical chemical sensors, or optodes, based on a change in optical absorption. In our case, however, the sensitive optical parameter to be measured was not the absorbance but the refract
4.3 Experimental results
4.3.1 Waveguide characterization
4.3.2 Light modulation
4.3.3 Ammonia sensing
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