Site-controlled nanostructure fabrication by selective area epitaxy through shadow masks / by Viktoriya Zolatanosha ; [1. Reviewer: Prof. Dr. Dirk Reuter, 2. Reviewer: Prof. Dr. Cedrik Meier]. Paderborn, 2020
Content
- Contents
- List of Figures
- List of Tables
- List of Abbreviations
- Deutsche Zusammenfassung
- Abstract
- Introduction
- Fundamentals
- Growth and characterization methods of III-V semiconductor nanostructures
- Fabrication of Si/Si3N4-mask
- Sample growth and characterization
- Selective Area Droplet Epitaxy procedure
- Key aspects of the deposition through a shadow mask
- Optimization of a site-controlled droplet formation through the shadow mask
- Summary
- Bibliography
- Appendix A: Wafer datasheets
- Appendix B: Mathematical representation of Si (100) etching
- Appendix C: List of Samples
- List of Publications
- Acknowledgements