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Remote Heteroepitaxy of In(x)Ga(1-x)As on graphene covered GaAs-(001) substrates / by Tobias Henksmeier ; [Doctoral committee: Prof. Dr. Dirk Reuter, Prof. Dr. Artur Zrenner]. Paderborn, 2021
Content
Contents
Introduction
Fundamentals
Properties of GaAs and In(x)Ga(1-x)As
Properties of Heteroepitaxy
Defects in III-As films
Remote Epitaxy
Diffraction phenomena
Experimental set-up
Molecular beam epitaxy
Reflection high-energy electron diffraction
Growth preparation
Reactive Ion Etching
Atomic force microscopy
High-resolution X-ray diffraction
Scanning electron microscopy
TEM, XPS, Raman
Graphene transfer and sample preparation
Results
Sample preparation towards remote epitaxy
Thermal annealing of graphene covered GaAs
Plasma etching of graphene covered GaAs
In(x)Ga(1-x)As nucleation on graphene covered GaAs
Dependence of nuclei distribution and size on temperature and indium concentration
TEM investigation of individual nuclei
In(x)Ga(1-x)As film growth on graphene covered GaAs
One-step InxGa1-xAs film growth
Two-step InxGa1-xAs film growth
InxGa1-xAs thickness variation
Conclusion and Outlook
Growth sheets
List of Figures
List of Tables
Acronyms
List of Publications
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